The Research and Development Laboratory of LTS is a corporate research laboratory that conducts a broadly-based multidisciplinary program of scientific research and advanced technological development directed toward the production and application of new and improved materials, techniques, equipment, system, chemical, optical, and space sciences, and related technologies. Our R&D group is a pioneer in development of DFM^® grade DUV/excimer laser optical coating materials for 157 nm and 193 nm semiconductor applications.

LTS's R&D program is the brainchild of Kanak Karmaker, who opened the facility in 1997. The mission of this laboratory is to perform R&D projects as part of LTS's Research Division. These projects include new materials design, enhancement and verification technology, establishment of protocol subsystems, quality control, etc.

Our NELAP certified laboratory is accredited by the New Jersey EPA and the New York Department of Health, allowing us to provide services to the local and national chemical industry.

Materials design is headed by Prof. Shin Wu, D.Sc., who has contributed his talent to the optical industry since 1973. Dr. Eugene Galkevych, Ph.D. is our veteran material scientist and designer. Our analytical laboratory conducts research in the following fields:

Chemical Physics: Emphasis of condensed matter, atomic and molecular physics, and chemistry, including applications  of spectroscopy to synthesis. The chemical physics track also includes irradiation effects at surfaces, thin film phenomena, layered structures, and atomic structures.

Materials Engineering: Emphasis of the structure and properties of materials and materials processing.

Materials Physics and Chemistry: Emphasis of condensed matter, atomic, and the molecular scale properties of materials.

Please click on the link to view our research, publications, and press releases.

-DFM ^® Fluorides playing role in 193/157 nm coating