X-ray Photoelectron Spectroscopy (XPS)

Elemental Composition and Chemical States

Request a quote / info

X-RAY PHOTOELECTRON SPECTROSCOPY (XPS)

XPS analysis is a surface-sensitive analytical technique used to measure the material's elemental composition and chemical state. XPS determines the kinetic energy distribution of photoelectrons emitted because of monochromatic X-ray irradiation. The binding energy is calculated from the energy of the irradiating X-rays and the kinetic energy of the photoelectrons (Refer to Figure).

E_BE = hν-E_KE -Ф

Where hν is the X-ray energy, E_KE is the kinetic energy of the emitted electron, and hν-E_KE -Ф is a constant, the work function of the spectrometer.

PROS OF XPS ANALYSIS

Surface analysis to determine the chemical composition of the sample
Quantitative analysis identifies the variation in the oxidation states of the samples
Measure all elements except Hydrogen (H) and Helium (H)
Distinguish Phosphine (PH₃) and Phosphate (PO4^3-) in phosphorous
Depth profile analysis for elements less than 1 at%

CONS OF XPS ANALYSIS

Limited to organic compounds
Non-ideal for liquid and gases
Limited analytical area of the sample
Not suitable for bulk or layered thin films <1 at%

TECHNICAL SPECIFICATIONS OF XPS ANALYSIS

Detects signal via emission of photoelectrons from the near-surface atoms
The detection limit is 0.1 at%
Can perform Imaging/Mapping
Surface sensitivity < 10 nm

Curious to know more about using X-ray Photoelectron Spectroscopy (XPS)?