Tantalum Iodide, Beads, 99.99%, -20 mesh

Tantalum(V) iodide is used as a precursor in chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes to create tantalum-based diffusion barriers and high-k dielectric layers in semiconductor devices.

Used as a high-purity source material for the deposition of tantalum-containing thin films via thermal evaporation or specialized vapor phase transport techniques.