Tantalum suboxide, Conical Insert, 99.99%, 40 cc

Tantalum suboxide is utilized as a sputtering target material to create oxygen-deficient tantalum oxide thin films with tunable refractive indices and electrical properties.

Used in vacuum deposition processes to create high-refractive index layers in multilayer interference filters and anti-reflective coatings.

Employed as a source material in physical vapor deposition to produce thin films where precise control over the oxygen stoichiometry is required.