Aluminum Tantalum Zirconium, Delta Target, 99.9%, Delta 200

Aluminum Tantalum Zirconium alloy targets are used in physical vapor deposition to create thin films with high thermal stability and corrosion resistance for microelectronic components.

Used as a master alloy to introduce tantalum and zirconium into aluminum-based systems to improve high-temperature mechanical properties and grain refinement.

This ternary alloy system is utilized in the development of oxidation-resistant coatings and structural materials capable of maintaining integrity at elevated temperatures.