Chemical Name
Tantalum aluminum Alloy
Chemical Formula
TaAl
Purity
99.95%
Composition
TiAl (50:50at%)
Size
13.446 inch dia. x 0.35 inch thick
EINECS Number
Quantity Available
pcs
CAS Number
Status
Product ID
ETTAAL13003N5
Hazmat
Catalog Number
15505
Description
Endura 200 mm
Comments
inred Available SMITY requires further machining
Tantalum aluminum alloy targets are used in physical vapor deposition to create thin films for resistor networks and barrier layers in integrated circuits.
Used as an additive in the production of superalloys to improve high-temperature strength and oxidation resistance.
Utilized in high-temperature environments due to its high melting point and structural stability under thermal stress.
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