Chemical Name
Amorphous Silicon
Chemical Formula
a-Si
Purity
99.999%
Composition
Size
1 -4 mm
EINECS Number
Quantity Available
kg
CAS Number
Status
Product ID
GPASI1400005N
Hazmat
Catalog Number
8262
Description
Amorphous
Comments
Used as a thin-film semiconductor material for solar cells, thin-film transistors (TFTs) in LCD displays, and image sensors.
Amorphous silicon targets are used in physical vapor deposition to create uniform thin films for optical coatings and microelectronic devices.
Investigated as a high-capacity anode material due to its ability to accommodate lithium ions, though often engineered at the nanoscale to manage volume expansion.
Applied as a high-refractive index layer in multilayer optical interference filters and anti-reflective coatings.
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