Hafnium Fluoride, Pieces, 99.95%, 1 -4 mm

Hafnium fluoride is utilized as a low-refractive index material in multilayer optical coatings, particularly for ultraviolet and infrared applications due to its wide transparency range.

Used as a source material in physical vapor deposition processes to create thin films for optical and electronic components.

Hafnium fluoride targets are used in sputtering processes to deposit high-purity fluoride thin films for specialized dielectric and protective layers.