Chemical Name
Hafnium Oxide:Neodymium Oxide [LPF-1]
Chemical Formula
HfO2:Nd2O3
Purity
99.995%
Composition
Size
1 -4 mm
EINECS Number
Quantity Available
kg
CAS Number
Status
Product ID
GPHFONDO144N5
Hazmat
Catalog Number
12
Description
Comments
Used as a sputtering target material to deposit neodymium-doped hafnium oxide thin films for high-k dielectric and ferroelectric research.
Applied via physical vapor deposition to create high-refractive index layers with specific spectroscopic properties provided by the neodymium dopant.
Used as a source material in electron-beam evaporation to produce specialized optical and electronic coatings.
Utilizes the unique electronic and optical transitions of Neodymium Oxide within a stable Hafnium Oxide matrix for laser and photonic applications.
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