Titania - Silica compound (80:20 ), Pieces, 99.95%, 1 -4 mm

Used as a sputtering target material to deposit composite thin films with controlled refractive indices for optical and protective coatings.

Applied as a high-refractive index material with improved thermal stability and low expansion properties for multilayer interference filters.

Utilized in physical vapor deposition processes to create thin films with specific optical properties and high durability.