Aluminum Oxide - Tantalum Oxide, Granules, 99.99%, 1 mm -4 mm

Aluminum Oxide - Tantalum Oxide composite targets are used in magnetron sputtering to deposit high-k dielectric thin films and protective coatings with tailored refractive indices.

This mixed oxide system is utilized to create thin films with high transparency and specific optical constants for interference filters and anti-reflective coatings.

Used as a source material in physical vapor deposition processes to produce stable, corrosion-resistant dielectric layers for microelectronic and optical devices.