Hafnium Oxide:Scandium Oxide, Granules, 99.995%, 1 mm -4 mm

Used as a high-purity sputtering target material to deposit scandium-doped hafnium oxide thin films for ferroelectric and high-k dielectric applications.

Applied via physical vapor deposition to create high-refractive index layers with high laser-induced damage thresholds in multilayer optical stacks.

Utilized in the development of ferroelectric field-effect transistors (FeFETs) and advanced CMOS gate stacks due to the stabilization of the ferroelectric orthorhombic phase.

Used as a source material for electron-beam evaporation to produce thin films with tailored dielectric constants and thermal stability.