Hafnium Scandium Oxide

Hafnium Scandium Oxide is utilized as a high-k dielectric material in advanced gate stacks to reduce leakage current while maintaining high capacitance in CMOS devices.

HfScO4 is fabricated into high-purity sputtering targets for the deposition of thin films used in microelectronic and optical applications.

Used as a high-refractive index material in multilayer optical coatings to enhance durability and performance in laser and sensor applications.