Indium Oxide-Molybdenum (doped), Granules, 99.99%, 2 mm -6 mm

Molybdenum-doped indium oxide (IMO) is utilized as a sputtering target material to deposit high-mobility transparent conductive oxide (TCO) thin films for advanced electronic devices.

Used in the fabrication of transparent electrodes for solar cells and flat panel displays due to its high carrier mobility and excellent optical transparency in the near-infrared region.

Applied as a high-performance thin-film transistor (TFT) channel material and transparent contact layer in semiconductor device architectures.