Tungsten Titanium Oxide, Granules, 99.95%, 3 mm -6 mm

Tungsten titanium oxide is utilized as a sputtering target material for the deposition of thin films in microelectronic and electrochromic devices.

Used to create thin films with specific refractive indices and high durability for precision optical components.

Applied as a functional oxide layer or diffusion barrier in semiconductor device fabrication.