Zirconium Alumnide, Granules, 99.95%, 3 mm -15 mm

Zirconium aluminide is utilized as a sputtering target material to deposit thin films that provide oxidation resistance and high-temperature stability in microelectronic and protective coating applications.

Used as an alloying additive in the production of high-performance aluminum alloys to refine grain structure and improve mechanical properties at elevated temperatures.

Due to its high melting point and thermodynamic stability, ZrAl3 is employed in the development of intermetallic compounds for structural components in high-temperature environments.