Zirconium Oxide - Hafnium Oxide (97:3), Granules, 99.99%, 1 mm -4 mm

Used as a high-purity sputtering target material to deposit thin films for optical coatings and gate dielectrics where the natural hafnium content provides enhanced thermal stability.

Applied via physical vapor deposition to create high-refractive index layers in multilayer interference filters and anti-reflective coatings.

Utilized in plasma spray processes to create thermal barrier coatings (TBCs) for aerospace and gas turbine components due to its low thermal conductivity and high melting point.

Used as a source material in electron beam evaporation to produce hard, chemically resistant thin films for protective and optical applications.

Employed in the production of high-temperature crucibles and ceramic components that require resistance to thermal shock and chemical erosion.