Chemical Name
Tantalum Bromide
Chemical Formula
TaBr5
Purity
99.99%
Composition
Size
2 -8 mm approx
EINECS Number
236-618-4
Quantity Available
kg
CAS Number
13451-11-1
Status
Product ID
LPTABR528004N
Hazmat
Catalog Number
6702
Description
Ultra dry
Comments
Moisture Sensitive, allow 2-4 weeks for ampulation.
Used as a precursor in chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes to create tantalum-based diffusion barriers and thin films in integrated circuits.
Utilized as a high-purity source material for the deposition of tantalum-containing layers in specialized thin-film applications.
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