Chemical Name
Bismuth
Chemical Formula
Bi
Purity
99.999%
Composition
Size
-100 mesh (75 mic aps) approx
EINECS Number
231-177-4
Quantity Available
kg
CAS Number
7440-69-9
Status
Product ID
POBI10000005N
Hazmat
Powder: Class 4.1, UN3089, PG II
Catalog Number
5660
Description
Comments
Product subject to export control 1C229Argon purged packing
Bismuth sputtering targets are used to deposit thin films for optical coatings, superconducting materials, and electronic components.
Bismuth is used as an alloying agent to create low-melting-point alloys (fusible alloys) and as a non-toxic replacement for lead in free-machining steels and brasses.
High-purity bismuth is utilized as an evaporation source for the thermal evaporation deposition of thin films in semiconductor and sensor manufacturing.
Bismuth is used in the production of compound semiconductors such as Bismuth Telluride (Bi2Te3) for thermoelectric cooling and power generation applications.
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