Chromium Silicide, Powder, 99.9%, -325 mesh

Chromium silicide is used as a sputtering target material to create thin films that provide oxidation resistance and electrical stability in microelectronic components.

Used in the fabrication of thin-film resistors and integrated circuits due to its stable piezoresistive properties and compatibility with silicon substrates.

Utilized for its high-temperature stability and resistance to chemical corrosion in harsh thermal environments.