Copper Aluminum Oxide, Powder, 99.95%, -325 mesh (17 mic aps)

Copper aluminum oxide is utilized as a sputtering target material for the deposition of p-type transparent conducting oxide (TCO) thin films in electronic and optoelectronic devices.

Used in the fabrication of transparent p-type semiconducting layers for solar cells and functional optical coatings due to its wide bandgap properties.

Investigated as a p-type semiconductor material for transparent electronics, enabling the development of transparent transistors and diodes.