Iron Silicide, Powder, 99.9%, -200 mesh (27 mic aps) approx

Iron silicide targets are used in magnetron sputtering to create thin films for magnetic sensors and microelectronic components.

FeSi is studied as a narrow-gap semiconductor and Kondo insulator for potential applications in thermoelectric and spintronic devices.

Used as an additive in the production of specialized steel and magnetic alloys to improve corrosion resistance and magnetic permeability.