Hafnium Bromide, Powder, 99.99%, -100 mesh approx

Hafnium bromide is used as a precursor in chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes to create hafnium-based high-k dielectric thin films for advanced logic and memory devices.

Used as a volatile source material for depositing hafnium dioxide layers which serve as high-refractive index components in multilayer optical coatings.