Chemical Name
Hafnium Bromide
Chemical Formula
HfBr4
Purity
99.99%
Composition
Size
-100 mesh approx
EINECS Number
237-416-9
Quantity Available
kg
CAS Number
13777-22-5
Status
Product ID
POHFBR410004N
Hazmat
Class 4.1, UN1759, PG II
Catalog Number
6622
Description
Ultra dry
Comments
Allow 2-4 weeks for ampulation Ultra Dry
Hafnium bromide is used as a precursor in chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes to create hafnium-based high-k dielectric thin films for advanced logic and memory devices.
Used as a volatile source material for depositing hafnium dioxide layers which serve as high-refractive index components in multilayer optical coatings.
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