Powder: Class 8, UN3260, PG II
Catalog Number
19502
Description
Comments
inred export license may be required, PG II, Class 8
Hafnium chloride is a primary precursor used in Atomic Layer Deposition (ALD) and Chemical Vapor Deposition (CVD) to create hafnium dioxide high-k dielectric layers in advanced integrated circuits.
Used as a precursor for depositing hafnium-based thin films that provide high refractive indices and durability for specialized optical coatings.
Utilized in the synthesis of hafnium-based nanoparticles and nanostructures through vapor-phase or solution-phase chemical reactions.
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