Hafnium Chloride, Powder, 99.95%, -100 mesh approx

Hafnium chloride is a primary precursor used in Atomic Layer Deposition (ALD) and Chemical Vapor Deposition (CVD) to create hafnium dioxide high-k dielectric layers in advanced integrated circuits.

Used as a precursor for depositing hafnium-based thin films that provide high refractive indices and durability for specialized optical coatings.

Utilized in the synthesis of hafnium-based nanoparticles and nanostructures through vapor-phase or solution-phase chemical reactions.