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Hafnium Iodide

Powder

Tags: Halides Iodide Powder Ampouled

Product Specifications

Chemical Name

Hafnium Iodide

Chemical Formula

HfI4

Purity

99.9%

Composition

Size

-100 mesh approx

EINECS Number

Quantity Available

CAS Number

13777-23-6

Status

Product ID

POHFI4100003N

Hazmat

Pieces: HazMat: UN3290

Catalog Number

6624

Description

Ultra dry

Comments

Allow 2-4 weeks for ampulation Ultra Dry

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General SpecificationsApplicationsSafety and ShippingCertificates of Analysis (COA)

Element Name

Hafnium Iodide

Symbol

HfI4

Atomic Number

Atomic Weight

686.11 g/mol

Melting Point

449 °C

Boiling Point

427 °C (sublimes)

Density

info

Evaporation materials

Hafnium(IV) iodide is utilized as a precursor in chemical vapor deposition and evaporation processes to deposit high-purity hafnium films or hafnium-based coatings.

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Semiconductors

Used as a volatile precursor for the deposition of hafnium dioxide (HfO2) thin films, which serve as high-k dielectrics in advanced semiconductor gate stacks.

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HazMat Classification

Pieces: HazMat: UN3290

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Documentation

Safety Data Sheet (SDS) and Certificate of Analysis (COA) available for download. GHS-compliant labeling provided with all shipments.

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Shipping

Shipped via FedEx Ground or UPS. Hazmat surcharges apply. International orders may require export compliance review. Custom packaging available.

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Quality Assurance

All products supplied with lot-specific COA including ICP-OES elemental analysis, XRD phase identification, and particle size distribution data.

Hafnium Iodide

Product Specifications

Evaporation materials

Semiconductors

HazMat Classification

Documentation

Shipping

Quality Assurance

Certificates of Analysis (COA)

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