Hafnium Iodide, Powder, 99.9%, -60 mesh

Hafnium(IV) iodide is utilized as a precursor in chemical vapor deposition and evaporation processes to deposit high-purity hafnium films or hafnium-based coatings.

Used as a volatile precursor for the deposition of hafnium dioxide (HfO2) thin films, which serve as high-k dielectrics in advanced semiconductor gate stacks.