Hafnium oxychloride hydrate, Powder, 99.95%, -100 mesh approx

Used as a precursor for the production of hafnium oxide (hafnia), which is a highly stable refractory material with a melting point over 2700 °C.

Serves as a high-purity chemical precursor for depositing hafnium-based thin films used in multilayer optical coatings and high-index layers.

Utilized in the synthesis of hafnium oxide nanoparticles and nanocrystals through hydrothermal or sol-gel processes for advanced material applications.