Hafnium Tantalum Oxide, Powder, 99.5%, -200 mesh approx

Hafnium Tantalum Oxide is used as a sputtering target material to deposit high-k dielectric thin films for advanced gate insulators and capacitor applications.

Utilized in the production of high-refractive index layers for multilayer optical coatings due to its high thermal stability and wide bandgap.

Applied as a high-permittivity (high-k) gate dielectric material in CMOS technology to reduce leakage current while maintaining high capacitance.