Hafnium Titanate (Hafnium Titanium Oxide), Powder, 99.9%, -140 mesh (42 mic aps) approx

Hafnium titanate is used as a sputtering target material to deposit high-dielectric constant (high-k) thin films for advanced gate insulators and capacitor applications.

Utilized in the production of multilayer optical coatings due to its high refractive index, wide bandgap, and excellent thermal stability.

Applied as a high-k dielectric material in semiconductor manufacturing to replace silicon dioxide, reducing leakage current in miniaturized electronic components.

Used in high-temperature environments due to its low thermal expansion coefficient and high melting point, providing excellent thermal shock resistance.