Lanthanum Silicide, Powder, 99.5%, 50 mesh

Lanthanum silicide is used as a sputtering target material for the deposition of thin films in microelectronic and semiconductor device fabrication.

Used in the formation of ohmic contacts and as a gate material in metal-oxide-semiconductor (MOS) structures due to its metallic conductivity and thermal stability.

Utilized as a functional rare earth intermetallic compound in the development of advanced electronic materials and thin-film coatings.