Chemical Name
Nickel Silicide
Chemical Formula
Ni2Si
Purity
99%
Composition
Size
-20 mesh
EINECS Number
Quantity Available
kg
CAS Number
12059-14-2
Status
Product ID
PONI2SI2002N0
Hazmat
Powder: HazMat, UN3077
Catalog Number
4952
Description
Comments
* in production
Nickel silicide is used as a contact material in CMOS technology to form low-resistance ohmic contacts and gates due to its low resistivity and low silicon consumption during formation.
Nickel silicide targets are utilized in physical vapor deposition processes to create thin film silicide layers for microelectronic device fabrication.
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