Chemical Name
Palladium
Chemical Formula
Pd
Purity
99.95%
Composition
Size
-20 +80 mesh
EINECS Number
Quantity Available
kg
CAS Number
7440-05-3
Status
Product ID
POPD2000003N5
Hazmat
Catalog Number
740
Description
Comments
1-1000 mic
Palladium sputtering targets are used to create thin films for microelectronics, sensors, and decorative coatings due to its excellent corrosion resistance and catalytic properties.
Palladium is utilized as a high-purity evaporation source in physical vapor deposition processes to form conductive layers and contact points in electronic devices.
Palladium is frequently alloyed with other metals to improve corrosion resistance, hardness, and hydrogen permeability in specialized industrial components.
Palladium nanoparticles are synthesized for high-surface-area applications, particularly in advanced catalysis and hydrogen sensing technologies.
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