Chemical Name
Ruthenium Silicide
Chemical Formula
Ru3Si2
Purity
99.95%
Composition
Size
-325 mesh (40 mic aps)
EINECS Number
Quantity Available
kg
CAS Number
NIL
Status
Product ID
PORU3SI23253N5
Hazmat
Catalog Number
6454
Description
Comments
Diffusion
Ruthenium silicide is utilized as a sputtering target material for the deposition of thin films in microelectronic devices, often serving as a diffusion barrier or a contact layer.
Used in the fabrication of semiconductor devices as a stable silicide contact material due to its high thermal stability and low resistivity.
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