Ruthenium acetylacetonate, Powder, 99.999%, -325 mesh (5 mic aps)

Ruthenium acetylacetonate is utilized as a volatile precursor in chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes to create high-purity ruthenium thin films for microelectronic components.

Used as a metal-organic precursor for the synthesis of ruthenium-based nanoparticles and nanostructured catalysts through thermal decomposition or solvothermal methods.