Tin Oxide, Powder, 99.95%, -325 mesh (19 mic aps)

Tin oxide is used as a precursor material in the fabrication of sputtering targets for the deposition of thin-film p-type semiconductors and transparent conducting oxides.

Tin(II) oxide acts as a p-type semiconductor material used in the development of thin-film transistors and gas sensors.

SnO is utilized as an evaporation source for creating thin layers in optical and electronic coating processes.