Chemical Name
Tantalum Boride
Chemical Formula
TaB2
Purity
99.5%
Composition
Size
-325 mesh
EINECS Number
Quantity Available
kg
CAS Number
12007-35-1
Status
Product ID
POTAB232502N5
Hazmat
Catalog Number
2705
Description
Comments
May contain other phases
Tantalum boride is utilized as a high-purity sputtering target material to deposit wear-resistant and diffusion-barrier thin films in microelectronic and industrial coating processes.
Due to its extremely high melting point and chemical stability, TaB2 is used in the production of high-temperature ceramic components and crucibles.
TaB2 is classified as an ultra-high temperature ceramic (UHTC), making it suitable for aerospace applications such as hypersonic flight vehicle components and rocket engine nozzles.
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