Chemical Name
Tantalum Boride
Chemical Formula
TaB
Purity
99.5%
Composition
Size
-325 mesh approx
EINECS Number
Quantity Available
kg
CAS Number
12007-07-7
Status
6 kg
Product ID
POTAB3250003N
Hazmat
Catalog Number
6704
Description
Comments
inred Presence of major TaB+ minorTaB2 phases
Tantalum boride is used as a sputtering target material to create hard, wear-resistant, and chemically inert thin films for microelectronics and protective coatings.
Due to its high melting point and extreme hardness, tantalum boride is utilized in the production of refractory components that must withstand high temperatures and corrosive environments.
TaB is employed in high-temperature structural applications where oxidation resistance and mechanical strength at elevated temperatures are required.
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