Tantalum Chloride, Powder, 99.999%, -50 mesh approx

Used as a precursor in Atomic Layer Deposition (ALD) and Chemical Vapor Deposition (CVD) to create tantalum nitride and tantalum oxide thin films for diffusion barriers and high-k dielectrics.

Utilized as a starting material for the deposition of Ta2O5 layers, which provide high refractive index and low absorption properties in multilayer optical coatings.