Chemical Name
Tantalum Chloride
Chemical Formula
TaCl5
Purity
99.99%
Composition
Size
-60 mesh approx
EINECS Number
231-755-6
Quantity Available
kg
CAS Number
7721-01-9
Status
Product ID
POTACL560004N
Hazmat
Catalog Number
6473
Description
Anhydrous
Comments
Allow 2-4 weeks for ampulation
Used as a precursor in Atomic Layer Deposition (ALD) and Chemical Vapor Deposition (CVD) to create tantalum nitride and tantalum oxide thin films for diffusion barriers and high-k dielectrics.
Utilized as a starting material for the deposition of Ta2O5 layers, which provide high refractive index and low absorption properties in multilayer optical coatings.
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