Titanium Aluminum Niobium Tantalum alloy, Powder, 99.9%, 53 -150 micron

Titanium Aluminum Niobium Tantalum alloy targets are used in magnetron sputtering to deposit high-performance thin films that provide superior oxidation resistance and hardness for aerospace and biomedical components.

This quaternary alloy is processed into spherical powder for additive manufacturing of lightweight, high-strength structural parts capable of withstanding extreme thermal environments.

Used as a specialized alloying system to enhance the creep resistance and high-temperature stability of titanium aluminide-based intermetallic compounds.