Tantalum Sulfide
PowderChemical Name
Chemical Formula
Purity
99.99%
Composition
Size
-325 mesh (5 mic aps)
EINECS Number
Quantity Available
kg
CAS Number
12143-72-5
Status
Product ID
POTAS2325004N
Hazmat
Catalog Number
154
Description
Comments
Tantalum sulfide is used as a sputtering target material for the deposition of transition metal dichalcogenide (TMDC) thin films in electronic and lubricating applications.
As a transition metal dichalcogenide, TaS2 is researched for its charge density wave properties and potential integration into next-generation 2D semiconductor devices.
TaS2 is utilized in the synthesis of two-dimensional nanosheets and nanotubes for exploring quantum phenomena and high-performance electrochemical sensing.
Loading COA files…