Titanium Silicide, Powder, 99.5%, -325 mesh

Titanium silicide targets are used in physical vapor deposition to create thin films for ohmic contacts and gate electrodes in microelectronic devices.

Used as a silicide material for source/drain contacts and interconnects due to its high thermal stability and low electrical resistivity.

Utilized for its high melting point and oxidation resistance in high-temperature structural components and protective coatings.