Chemical Name
Titanium Iodide
Chemical Formula
TiI4
Purity
99.999%
Composition
Size
-100 mesh approx
EINECS Number
231-754-0
Quantity Available
kg
CAS Number
7720-83-4
Status
Product ID
POTII4100005N
Hazmat
Powder: HazMat: UN1871
Catalog Number
574
Description
Ultra dry
Comments
Allow extra time for ampulation
Titanium(IV) iodide is used as a precursor in chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes to deposit high-purity titanium nitride or titanium dioxide thin films in semiconductor manufacturing.
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