Chemical Name
Titanium Silicide
Chemical Formula
TiSi2
Purity
99.5%
Composition
Size
-60 mesh (96 mic aps) approx
EINECS Number
234-904-3
Quantity Available
kg
CAS Number
12039-83-7
Status
Product ID
POTISI26002N5
Hazmat
Powder: Class 4.1, UN3178, PG III
Catalog Number
4780
Description
Comments
inred XRD and PSD report available upon request
Titanium silicide is widely used as a contact material and for interconnects in CMOS fabrication due to its low electrical resistivity and high thermal stability.
Used as a sputtering target material to deposit thin films for microelectronic circuits and protective coatings.
Utilized for its high melting point and oxidation resistance in high-temperature structural applications and coatings.
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