Chemical Name
Zirconium Silicide
Chemical Formula
ZrSi2
Purity
99.9%
Composition
Size
-325 mesh (30 mic aps) approx
EINECS Number
234-911-1
Quantity Available
kg
CAS Number
12039-90-6
Status
Product ID
POZRSI232503N
Hazmat
Catalog Number
2033
Description
Comments
inred Minor phase of unreacted Si present in it
Zirconium silicide is used as a sputtering target material to create thin films that provide oxidation resistance and high-temperature stability in microelectronic and protective coating applications.
Due to its high melting point and chemical stability, zirconium silicide is utilized in the production of refractory components and ceramics that must withstand corrosive environments.
Used in the semiconductor industry for the formation of ohmic contacts and as a diffusion barrier material in integrated circuit fabrication.
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