Zirconium Silicide, Powder, 99.9%, -325 mesh (30 mic aps) approx

Zirconium silicide is used as a sputtering target material to create thin films that provide oxidation resistance and high-temperature stability in microelectronic and protective coating applications.

Due to its high melting point and chemical stability, zirconium silicide is utilized in the production of refractory components and ceramics that must withstand corrosive environments.

Used in the semiconductor industry for the formation of ohmic contacts and as a diffusion barrier material in integrated circuit fabrication.