Silicon Oxide
PowderChemical Name
Chemical Formula
Purity
99.9%
Composition
x = 2
Size
-100 mesh
EINECS Number
Quantity Available
CAS Number
7631-86-9
Status
Product ID
SIOXPO449210
Hazmat
Catalog Number
20514
Description
crystalline
Comments
Silicon oxide targets are used in magnetron sputtering to deposit thin films that serve as protective barriers or dielectric layers in microelectronic and optical devices.
Used as a low-refractive index material for multilayer interference filters and anti-reflective coatings on glass and plastic substrates.
Silicon monoxide is frequently used as an evaporation source in vacuum deposition processes to create thin films for moisture barriers and optical applications.
Silicon suboxides (SiOx) are utilized as high-capacity anode materials to mitigate the volume expansion issues associated with pure silicon during lithiation.
Loading COA files…