Aluminum Fluoride-Magnesium Fluoride
Sputtering TargetChemical Name
Chemical Formula
Purity
99.9%
Composition
97:3 wt%
Size
4 inch dia x 0.250 inch th.
EINECS Number
Quantity Available
pcs
CAS Number
Status
Product ID
SPALF3MGF24D6T3N
Hazmat
Catalog Number
7935
Description
Comments
Aluminum Fluoride-Magnesium Fluoride mixtures are used as sputtering targets to deposit low-refractive index thin films for specialized optical and protective coatings.
This composite fluoride material is utilized in the fabrication of multi-layer optical coatings, providing specific refractive index properties and high transparency in the UV to IR range.
AlF3-MgF2 is employed as an evaporation source material in physical vapor deposition processes to create thin films for anti-reflective coatings and optical filters.
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