Aluminum Oxide - Yttrium Oxide, Sputtering Target, 99.99%, 2 inch dia x 0.125 inch th.

Aluminum Oxide - Yttrium Oxide (YAM) is used as a sputtering target material to create high-performance dielectric thin films and protective coatings in vacuum deposition processes.

Used to produce thin films with specific refractive indices and high durability for optical components and laser systems.

Utilized as a source material in physical vapor deposition to deposit mixed oxide layers for electronic and optical applications.