Aluminum Scandium Alloy
Sputtering TargetChemical Name
Chemical Formula
Purity
99.9%
Composition
Al0.8Sc0.2
Size
2 inch dia x 0.25 inch th.
EINECS Number
Quantity Available
pcs
CAS Number
Status
Product ID
SPALSC2D6T03N-2
Hazmat
Not hazardous for transportation
Catalog Number
17588
Description
Comments
Aluminum Scandium alloy targets are used in magnetron sputtering to deposit thin films for piezoelectric MEMS devices, such as Bulk Acoustic Wave (BAW) filters.
Used as a high-strength alloying additive in aerospace and automotive components to improve weldability, refine grain structure, and increase recrystallization temperature.
Utilized in additive manufacturing processes like Selective Laser Melting (SLM) to produce lightweight, high-strength structural parts with excellent thermal stability.
Applied in the fabrication of high-frequency power electronics and RF filters due to the enhanced piezoelectric properties of AlScN layers.
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