Aluminum Silicon Alloy
Sputtering TargetChemical Name
Chemical Formula
Purity
99.99%
Composition
60:40 at%
Size
2 inch dia x 0.117 inch th.
EINECS Number
Quantity Available
pcs
CAS Number
11145-27-0
Status
Product ID
SPALSI2D0T04N-1
Hazmat
Powder: Class 4.3, UN1398, PG III
Catalog Number
6195
Description
Comments
Aluminum Silicon alloy targets are used in physical vapor deposition to create thin films for semiconductor metallization and barrier layers.
Used as a master alloy to improve the fluidity, castability, and corrosion resistance of aluminum-based engineering components.
AlSi powders, particularly AlSi10Mg, are widely used in selective laser melting (SLM) for lightweight structural aerospace and automotive parts.
Applied via plasma or flame spray to provide wear resistance and thermal management coatings on engine components.
Used in vacuum evaporation processes to deposit reflective coatings and conductive layers in microelectronic packaging.
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